IRW 2005 DISCUSSION GROUPS (Home)

TOPIC*

MODERATORS

1) Gate oxide / High-k reliability

Guillaume Ribes (ST Micro) and John Suehle (NIST)

2) NBTI

Jason Campbell (Penn State Univ.) and Vincent Huard (Philips Semiconductors)

3) Interconnect reliability

John Euler (QualiTau) and Tim Sullivan (IBM Microelectronics)

4) Product/Circuit reliability

Mark Porter (Medtronic) and t.b.a.

Abstracts and Questionnaires

Please click on the links above for the abstract and questionnaire of each discussion group.  For the topics you are interested in, please download and complete the questionnaire and e-mail the file to ynelson@qualcomm.com by 10/10/05, who will forward it to the appropriate moderator(s). Thank you for helping to improve the efficiency of the IRW discussion groups.

*Another discussion group (DG) may be added if there is sufficient interest in a certain topic. If you desire to discuss a certain topic, please indicate on the registration form and also contact Yvonne Nelson (DG Chair) ynelson@qualcomm.com, especially if you would be willing to volunteer to moderate the discussion of that topic. If we do not have enough people interested in a newly proposed topic it is still possible to form a special interest group (SIG – see SIG page). Yvonne will let you know whether an additionally proposed topic has potential to become DG or SIG.