tutorial speaker

Affiliation

 tutorial topic

Hans Reisinger

Infineon,
Germany

NBTI

Jim Lloyd

SUNY Albany,
New York

Latest Developments in
Failure Modeling of
Electromigration and ILD TDDB

Norbert Seifert

Intel,
USA

Radiation-induced Soft Errors: Status Quo and Key Challenges

Michael Dammann

IAF Fraunhofer,
Germany

Reliability & degradation mechanism of AlGaN/GaN high electron mobility transistors

Joe McPherson

Consultant,
TI Fellow Emeritus,
USA

TDDB Physics: Transitioning From Silica to High-k Gate Dielectrics

Alain Bravaix

ISEN, France

Hot-Carrier Degradation Issues in advanced CMOS nodes