IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP
held October 17-21, 2010

2010 Group Picture

The final report of the 2010 International Integrated Reliability Workshop represents the final product of the many authors and volunteers who made this year’s meeting a great success. Since it began in 1982 as the Wafer Level Reliability Workshop, the meeting has maintained a character very different from most other scientific and technical meetings.

Attendees are encouraged and expected to participate actively in every aspect of the Workshop, to share their own results and insights, to question speakers, to take part in the discussion groups and special interest groups. Since it began, the Workshop has maintained an atmosphere which fosters close interaction among attendees in a setting of great natural beauty with minimal distractions.

We were very fortunate to have a distinguished keynote speaker this year, Dr. Raj Jammy, Vice President of Materials and Emerging Technology, SEMATECH. His extremely informative lecture entitled: “Life beyond Si: More Moore or More than Moore?” set the tone of the very productive meeting in the emerging and non-traditional area. (2010 Keynote Visuals)

This year, we had extensive learning opportunities with a special talk on Smart Grid and 6 tutorials presented by world-class experts. The special talk and the tutorials started on Sunday evening and continued through the whole workshop, being interwoven into the technical program. This year’s tutorial topics include: NBTI, Electromigration and ILD TDDB, Radiation-induced Soft Errors, III-V compound semiconductor reliability, High-k Gate Dielectric TDDB, and Hot-Carrier Degradation Issues

For the 2nd year in a row, we have invited papers in the technical program.  The 6 invited presentations together with 21 contributed oral presentations and 19 fully peer reviewed poster presentations as well as several walk-in posters formed a very strong technical IIRW 2010 program. All the presentations are given in serial, drawing all the attention from all the attendees with very fruitful discussions.

As is always the case, the evenings were fully occupied by poster sessions, discussion groups (DGs) and special interest groups (SIGs). The poster presentations were given on both Monday and Wednesday in the evening. These two evening poster sessions gave the attendees and authors plenty of time to have in-depth discussions with useful feedback.

The discussion groups on the topics of fWLR, NBTI, BEOL, high-k, and Product reliability addressed various views in the common interest area, and the discussions lasted till late in the evenings.

Helped by the great location and nice weather, the “free program” on Wednesday afternoon generated many Giga-bytes of desktop-background photos, in parallel to the “off line” discussions and networking, yielding an excellent memory of this year’s IIRW.

Presented to you in the final report is the collection of the papers presented, the abstracts of the keynote address, the abstracts of the tutorials, and the summaries of the discussion groups. For the attendees, this workshop has been intellectually stimulating and informative.

This year’s workshop could not have taken place without the hard work of many volunteers on the technical program committee and the management committee. It was great to work with all of you!

Next year’s workshop will be held from October 16 to 20, 2011. Additional details about next year’s meeting can be found in the call for papers  and at www.iirw.org.

Hope to see you at next year’s workshop.

Chadwin Young

General Chair , IIRW 2010